The sputtered silver nanocluster/silica-based coating was deposited on two disposable facial FFP3 masks (3M). the radio frequency co-sputtering process was performed in pure argon atmosphere, applying 200 W RF power on silica target and 3 or 5 W in DC on silver target obtaining coating with less (Ag5W) amount of silver nanocluster.
Scanning electron microscopy (Field Emission scanning Electron Microscope FESEM, QUANTA INSPECT 200, ZEISS SUPRATM 40) equipped with energy dispersive spectroscopy (ESD, EDAX PV 9900) was used to observe the morphology and to detect the composition (3 areas at 170 x of magnification) of the coating on mask fibre.
"Best face-mask i've ever worn, the ear hooks are convenient, relaxing and not hurting at all."
- John Ndukka
“Amazing mask, serving it's medical and aesthetic purpose... I Love it and I am getting another one please.”
- Salako Juliana
"Admin... please how do I purchase the mask in bulk proportion."
- Isabael Chritiana
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